Conductive Scanning Probe Microscopy Nanopatterning:
Caption: (a) 60 nm wide oxide lines nanopatterned on atomically flat Si(111):H using field induced oxidation in air. (b) 18 nm wide lines of 1-decanol nanopatterned on atomically flat Si(111):H using liquid phase nanolithography in neat 1-decanol. (c) 3 x 3 array of individual dangling bonds nanopatterned with feedback controlled lithography on Si(100)-2x1:H in ultra-high vacuum.
Relevant Publications:
[1] H. Jin, C. R. Kinser, P. A. Bertin, D. E. Kramer, J. A. Libera, M. C. Hersam, S. T. Nguyen, and M. J. Bedzyk, “X-ray studies of self-assembled monolayers grown on hydrogen-terminated Si(111),” Langmuir, 20, 6252 (2004).
[2] A. S. Baluch, N. P. Guisinger, R. Basu, E. T. Foley, and M. C. Hersam, “Atomic-level robustness of the Si(100)-2x1:H surface following liquid phase chemical treatments in atmospheric pressure environments,” J. Vac. Sci. Technol. A, 22, L1 (2004).
[3] M. W. Such, D. E. Kramer, and M. C. Hersam, “Reproducible lateral force microscopy measurements for quantitative comparisons of the frictional and chemical properties of nanostructures,” Ultramicroscopy, 99, 189 (2004).
[4] A. S. Baluch, R. Basu, N. P. Guisinger, C. R. Kinser, D. E. Kramer, M. W. Such, and M. C. Hersam, “Nanoscale control of friction and chemistry on silicon surfaces,” Mat. Res. Soc. Symp. Proc., 750, Y9.1.1 (2003).
Collaborators: SonBinh Nguyen (NU Chemistry), Michael Bedzyk (NU MSE)