Embedded, optically transparent, electrically conducting oxide nanowires, and other patterns are written on highly resistive transparent metal oxide thin films with nanoscale spatial control using focused ion beam implantation. The resulting transparent conducting oxide features are 110-160 nm wide, 7 nm deep, and are theoretically limitless in length, connectivity, and shape. N. E. Sosa, J. Liu, C. Chen, T. J. Marks, and M. C. Hersam, “Nanoscale writing of transparent conducting oxide features with a focused ion beam,” Advanced Materials 21, 721 (2009).
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